Invention Grant
- Patent Title: Apparatus for controlling gas distribution using orifice ratio conductance control
- Patent Title (中): 使用孔径比电导控制来控制气体分布的装置
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Application No.: US13091827Application Date: 2011-04-21
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Publication No.: US08905074B2Publication Date: 2014-12-09
- Inventor: Corie Lynn Cobb , Ming Xu
- Applicant: Corie Lynn Cobb , Ming Xu
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: F17D3/00
- IPC: F17D3/00 ; F16K51/02

Abstract:
Apparatus for controlling gas distribution are provided. In some embodiments, apparatus for controlling gas distribution may include a first flow path from an inlet to a first outlet; a plurality of first orifices disposed within the first flow path; a plurality of first valves that control gas flow through the plurality of first orifices to control a total gas flow at the first outlet; a second flow path from the inlet to a second outlet; a plurality of second orifices disposed along the second flow path; a plurality of second valves that control gas flow through respective ones of the plurality of second orifices to control a total gas flow at the second outlet; and a mounting block having the plurality of first valves and second valves coupled thereto, wherein at least a portion of the first flow path and the second flow path is disposed within the mounting block.
Public/Granted literature
- US20120097266A1 APPARATUS FOR CONTROLLING GAS DISTRIBUTION USING ORIFICE RATIO CONDUCTANCE CONTROL Public/Granted day:2012-04-26
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