Invention Grant
- Patent Title: Charged particle beam system aperture
- Patent Title (中): 带电粒子束系统孔径
-
Application No.: US13669626Application Date: 2012-11-06
-
Publication No.: US08907296B2Publication Date: 2014-12-09
- Inventor: N. William Parker , Mark W. Utlaut , David William Tuggle , Jeremy Graham
- Applicant: FEI Company
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, PC
- Agent Michael O. Scheinberg; John E. Hillert
- Main IPC: H01J3/14
- IPC: H01J3/14 ; H01J37/09 ; G21K1/00
Abstract:
An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening is made in a thin conductive film positioned over a cavity in a support substrate, where the aperture size and shape is determined by the opening in the conductive film and not determined by the substrate.
Public/Granted literature
- US20130181140A1 Charged Particle Beam System Aperture Public/Granted day:2013-07-18
Information query
