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公开(公告)号：US09401262B2
公开(公告)日：2016-07-26
申请号：US14710205
申请日：2015-05-12
Applicant: FEI Company
Inventor： Noel Smith , Clive D. Chandler , Mark W. Utlaut , Paul P. Tesch , David William Tuggle
IPC: H01J37/08 , H01J27/16 , H01J37/30 , C23C14/00 , H01J37/305 , H01J37/317 , H01J37/32 , C23C14/22
CPC classification number: H01J37/3007 , C23C14/0031 , C23C14/221 , H01J27/16 , H01J37/08 , H01J37/305 , H01J37/3053 , H01J37/3056 , H01J37/3178 , H01J37/32082 , H01J37/3211 , H01J2237/006 , H01J2237/0817 , H01J2237/0827 , H01J2237/31 , H01J2237/31749
Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.
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公开(公告)号：US09029812B2
公开(公告)日：2015-05-12
申请号：US14247879
申请日：2014-04-08
Applicant: FEI Company
Inventor： Noel Smith , Clive D. Chandler , Mark W. Utlaut , Paul P. Tesch , David William Tuggle
IPC: H01J37/08 , H01J37/305 , H01J37/30 , C23C14/00 , H01J27/16 , H01J37/317 , H01J37/32 , C23C14/22
CPC classification number: H01J37/3007 , C23C14/0031 , C23C14/221 , H01J27/16 , H01J37/08 , H01J37/305 , H01J37/3053 , H01J37/3056 , H01J37/3178 , H01J37/32082 , H01J37/3211 , H01J2237/006 , H01J2237/0817 , H01J2237/0827 , H01J2237/31 , H01J2237/31749
Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.
Abstract translation: 本发明提供了一种等离子体离子束系统，其包括多个气体源，并且可用于使用不同离子种类进行多个操作以产生或改变工件的亚微米特征。 该系统优选使用电感耦合的磁增强离子束源，其适合与探针形成光学源结合以产生各种离子的离子束，而不会由源引起的实质动能振荡，从而允许形成高分辨率 光束。
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公开(公告)号：US08803102B2
公开(公告)日：2014-08-12
申请号：US13847313
申请日：2013-03-19
Applicant: FEI Company
Inventor： David William Tuggle , James B. McGinn , Charles Otis
CPC classification number: H01J37/244 , H01J2237/12 , H01J2237/1501 , H01J2237/24485 , H01J2237/2449 , H01J2237/24514
Abstract: A retarding field analyzer uses the existing components of a charged particle beam system eliminating the need for inserting a separate retarding field analyzer device. Using components of the existing column reduces the time required to analyze the beam. Using the imaging capabilities of the existing column facilitates alignment of the beam with the analyzer.
Abstract translation: 延迟场分析仪使用带电粒子束系统的现有部件，消除了插入单独的延迟场分析仪装置的需要。 使用现有列的组件可减少分析光束所需的时间。 使用现有列的成像能力有助于光束与分析仪的对准。
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公开(公告)号：US20170125207A1
公开(公告)日：2017-05-04
申请号：US14981164
申请日：2015-12-28
Applicant: FEI Company
Inventor： Richard Swinford , Mostafa Maazouz , David William Tuggle , William M. Steinhardt
CPC classification number: H01J37/21 , H01J37/10 , H01J37/31 , H01J2237/0453 , H01J2237/30472 , H01J2237/317 , H01J2237/31745 , H01J2237/31749
Abstract: The present invention provides a method for optimizing a shaped working beam having a sharp edge for making sufficiently precise cuts and a high beam current for faster processing. An ion beam is directed along an optical column through a reference aperture to form a reference beam that has a preferred shape and an associated reference current. The reference beam is optimized using selected parameters of the optical components within the optical column. The ion beam is then directed through a working aperture to form a working beam for use in a processing application. The working beam has a different shape from the reference beam and an associated working current that is higher than the reference current. The reference aperture and working aperture have at least one corresponding dimension. The working beam is then optimized using the selected optical component parameters used to align and focus the reference beam.
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公开(公告)号：US08907296B2
公开(公告)日：2014-12-09
申请号：US13669626
申请日：2012-11-06
Applicant: FEI Company
Inventor： N. William Parker , Mark W. Utlaut , David William Tuggle , Jeremy Graham
CPC classification number: G21K1/00 , H01J37/09 , H01J2237/045 , H01J2237/0453
Abstract: An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening is made in a thin conductive film positioned over a cavity in a support substrate, where the aperture size and shape is determined by the opening in the conductive film and not determined by the substrate.
Abstract translation: 实现了改进的光束限定孔结构和制造方法。 开口开口形成在位于支撑衬底中的空腔上方的薄导电膜中，其中孔径尺寸和形状由导电膜中的开口确定并且不由衬底确定。
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Patent Agency Ranking
公开(公告)号：US20140312245A1
公开(公告)日：2014-10-23
申请号：US14247879
申请日：2014-04-08
Applicant: FEI Company
Inventor： Noel Smith , Clive D. Chandler , Mark W. Utlaut , Paul P. Tesch , David William Tuggle
CPC classification number: H01J37/3007 , C23C14/0031 , C23C14/221 , H01J27/16 , H01J37/08 , H01J37/305 , H01J37/3053 , H01J37/3056 , H01J37/3178 , H01J37/32082 , H01J37/3211 , H01J2237/006 , H01J2237/0817 , H01J2237/0827 , H01J2237/31 , H01J2237/31749
Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.
Abstract translation: 本发明提供了一种等离子体离子束系统，其包括多个气体源，并且可用于使用不同离子种类进行多个操作以产生或改变工件的亚微米特征。 该系统优选使用电感耦合的磁增强离子束源，其适合与探针形成光学源结合以产生各种离子的离子束，而不会由源引起的实质动能振荡，从而允许形成高分辨率 光束。
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公开(公告)号：US20140117233A1
公开(公告)日：2014-05-01
申请号：US13847313
申请日：2013-03-19
Applicant: FEI Company
Inventor： David William Tuggle , James B. McGinn , Charles Otis
IPC: H01J37/147
CPC classification number: H01J37/244 , H01J2237/12 , H01J2237/1501 , H01J2237/24485 , H01J2237/2449 , H01J2237/24514
Abstract: A retarding field analyzer uses the existing components of a charged particle beam system eliminating the need for inserting a separate retarding field analyzer device. Using components of the existing column reduces the time required to analyze the beam. Using the imaging capabilities of the existing column facilitates alignment of the beam with the analyzer.
Abstract translation: 延迟场分析仪使用带电粒子束系统的现有部件，消除了插入单独的延迟场分析仪装置的需要。 使用现有列的组件可减少分析光束所需的时间。 使用现有列的成像能力有助于光束与分析仪的对准。
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公开(公告)号：US09679742B2
公开(公告)日：2017-06-13
申请号：US14981164
申请日：2015-12-28
Applicant: FEI Company
Inventor： Richard Swinford , Mostafa Maazouz , David William Tuggle , William M. Steinhardt
CPC classification number: H01J37/21 , H01J37/10 , H01J37/31 , H01J2237/0453 , H01J2237/30472 , H01J2237/317 , H01J2237/31745 , H01J2237/31749
Abstract: The present invention provides a method for optimizing a shaped working beam having a sharp edge for making sufficiently precise cuts and a high beam current for faster processing. An ion beam is directed along an optical column through a reference aperture to form a reference beam that has a preferred shape and an associated reference current. The reference beam is optimized using selected parameters of the optical components within the optical column. The ion beam is then directed through a working aperture to form a working beam for use in a processing application. The working beam has a different shape from the reference beam and an associated working current that is higher than the reference current. The reference aperture and working aperture have at least one corresponding dimension. The working beam is then optimized using the selected optical component parameters used to align and focus the reference beam.
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公开(公告)号：US20150318140A1
公开(公告)日：2015-11-05
申请号：US14710205
申请日：2015-05-12
Applicant: FEI Company
Inventor： Noel Smith , Clive D. Chandler , Mark W. Utlaut , Paul P. Tesch , David William Tuggle
CPC classification number: H01J37/3007 , C23C14/0031 , C23C14/221 , H01J27/16 , H01J37/08 , H01J37/305 , H01J37/3053 , H01J37/3056 , H01J37/3178 , H01J37/32082 , H01J37/3211 , H01J2237/006 , H01J2237/0817 , H01J2237/0827 , H01J2237/31 , H01J2237/31749
Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.
Abstract translation: 本发明提供了一种等离子体离子束系统，其包括多个气体源，并且可用于使用不同离子种类进行多个操作以产生或改变工件的亚微米特征。 该系统优选使用电感耦合的磁增强离子束源，其适合与探针形成光学源结合以产生各种离子的离子束，而不会由源引起的实质动能振荡，从而允许形成高分辨率 光束。
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公开(公告)号：US20130181140A1
公开(公告)日：2013-07-18
申请号：US13669626
申请日：2012-11-06
Applicant: FEI Company
Inventor： N. William Parker , Mark W. Utlaut , David William Tuggle , Jeremy Graham
IPC: G21K1/00
CPC classification number: G21K1/00 , H01J37/09 , H01J2237/045 , H01J2237/0453
Abstract: An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening is made in a thin conductive film positioned over a cavity in a support substrate, where the aperture size and shape is determined by the opening in the conductive film and not determined by the substrate.
Abstract translation: 实现了改进的光束限定孔结构和制造方法。 开口开口形成在位于支撑衬底中的空腔上方的薄导电膜中，其中孔径尺寸和形状由导电膜中的开口确定并且不由衬底确定。
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