Invention Grant
- Patent Title: Insulated gate bipolar transistor
- Patent Title (中): 绝缘栅双极晶体管
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Application No.: US14134066Application Date: 2013-12-19
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Publication No.: US08907374B2Publication Date: 2014-12-09
- Inventor: Yisheng Zhu , Jinping Zhang
- Applicant: Huawei Technologies Co., Ltd.
- Applicant Address: CN Shenzhen
- Assignee: Hauwei Technologies Co., Ltd.
- Current Assignee: Hauwei Technologies Co., Ltd.
- Current Assignee Address: CN Shenzhen
- Agency: Staas & Halsey LLP
- Priority: CN201310037476 20130130
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/739 ; H01L29/08

Abstract:
Embodiments of the present invention provide an IGBT, which relates to the field of integrated circuit manufacturing, and may improve a problem of tail current when the IGBT is turned off. The IGBT includes a cell region on a front surface, a terminal region surrounding the cell region, an IGBT drift region of a first conductivity type, and an IGBT collector region on a back surface. The IGBT collector region is connected to the IGBT drift region and under the IGBT drift region. The IGBT drift region includes a first drift region under the cell region and a second drift region under the terminal region. The IGBT collector region includes a cell collector region of a heavily doped second conductivity type under the first drift region and a non-conductive isolation region adjacent to the cell collector region.
Public/Granted literature
- US20140209971A1 INSULATED GATE BIPOLAR TRANSISTOR Public/Granted day:2014-07-31
Information query
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