发明授权
- 专利标题: Method of storing lanthanum oxide target, and vacuum-sealed lanthanum oxide target
- 专利标题(中): 储存氧化镧靶的方法和真空密封氧化镧靶
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申请号: US13319190申请日: 2010-10-05
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公开(公告)号: US08911600B2公开(公告)日: 2014-12-16
- 发明人: Kazuyuki Satoh , Yoshimasa Koido
- 申请人: Kazuyuki Satoh , Yoshimasa Koido
- 申请人地址: JP Tokyo
- 专利权人: JX Nippon Mining & Metals Corporation
- 当前专利权人: JX Nippon Mining & Metals Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Howson & Howson LLP
- 优先权: JP2009-261788 20091117
- 国际申请: PCT/JP2010/067401 WO 20101005
- 国际公布: WO2011/062003 WO 20110526
- 主分类号: C23C14/00
- IPC分类号: C23C14/00 ; C23C14/34 ; C04B35/50
摘要:
A method of storing a sputtering target made of lanthanum oxide, wherein a lanthanum oxide target to which a lanthanum fluoride film was formed and lanthanum oxide powder are charged in a vacuum pack with an oxygen transmission rate of 0.1 cm3/m2 per 24 h at 1 atm or less and a moisture vapor transmission rate of 0.1 g/m2 per 24 h or less, and, after charging the target and the powder, the vacuum pack is subject to vacuum suction and sealing for storage. This invention aims to provide technology for enabling the long-term storage of a sputtering target in a usable state by devising the method of storing a target made of an oxide of lanthanum as a rare earth metal, and thereby inhibiting the pulverization phenomenon of the target caused by the hydration (hydroxylation) of such target due to residual air or the inclusion of air, and the pulverization phenomenon caused by the formation of carbonate.
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