发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US11730749申请日： 2007-04-03
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公开(公告)号： US08913228B2公开(公告)日： 2014-12-16
- 发明人: Maurice Wijckmans , Martinus Agnes Willem Cuijpers , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Theodorus Petrus Maria Cadee , Frederik Eduard De Jong , Wilhelmus Franciscus Johannes Simons , Edwin Augustinus Matheus Van Gompel , Martin Frans Pierre Smeets , Rob Jansen , Gerardus Adrianus Antonius Maria Kusters , Martijn Van Baren
- 申请人： Maurice Wijckmans , Martinus Agnes Willem Cuijpers , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Theodorus Petrus Maria Cadee , Frederik Eduard De Jong , Wilhelmus Franciscus Johannes Simons , Edwin Augustinus Matheus Van Gompel , Martin Frans Pierre Smeets , Rob Jansen , Gerardus Adrianus Antonius Maria Kusters , Martijn Van Baren
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/58
- IPC分类号： G03B27/58 ; G03F7/20 ; F16L55/053
摘要：
A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.
公开/授权文献
- US20070242245A1 Lithographic apparatus and device manufacturing method 公开/授权日：2007-10-18
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