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公开(公告)号：US08976335B2
公开(公告)日：2015-03-10
申请号：US13333237
申请日：2011-12-21
IPC: G03F7/20 , H01L21/683 , H01L21/687
CPC classification number: G03F7/70875 , G03F7/70716 , H01L21/683 , H01L21/6875
Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus having a first object and a planar member mounted on the first object to improve thermal transfer to/from a second object.
Abstract translation: 布置成将图案从图案形成装置转印到基板上的光刻设备，所述光刻设备具有安装在第一物体上的第一物体和平面元件，以改善与第二物体的热传递。
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2.发明授权Measuring method, measuring apparatus, lithographic apparatus and device manufacturing method 有权测量方法，测量仪器，光刻设备和器件制造方法公开(公告)号：US08593646B2
公开(公告)日：2013-11-26
申请号：US13369614
申请日：2012-02-09
Applicant: Arie Jeffrey Den Boef , Marcel Hendrikus Maria Beems , Theodorus Petrus Maria Cadee , Raymond Wilhelmus Louis Lafarre
Inventor： Arie Jeffrey Den Boef , Marcel Hendrikus Maria Beems , Theodorus Petrus Maria Cadee , Raymond Wilhelmus Louis Lafarre
CPC classification number: G01B11/14 , G01B11/00 , G02B21/0048 , G02B26/105 , G03F7/70625 , G03F9/7088
Abstract: An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). A measurement optical system comprises illumination subsystem (504) for illuminating the mark with a spot of radiation (206) and as detecting subsystem (580) for detecting radiation diffracted by the mark. The substrate and measurement optical system move relative to one another at a first velocity (vW) so as to scan the mark while synchronously moving the spot of radiation relative to the reference frame (RF) of the measurement optical system at a second velocity (vSPOT). The spot scans the mark at a third velocity (vEFF) which is lower than the first velocity to allow more time for accurate position measurements to be acquired. In one embodiment, an objective lens (524) remains fixed in relation to the reference frame while a moving optical element (562) imparts the movement of the radiation spot relative to the reference frame.
Abstract translation: 设备（AS）测量光刻基板（W）上的标记（202）的位置。 测量光学系统包括用于利用辐射点（206）照亮标记的照明子系统（504）和用于检测由标记衍射的辐射的检测子系统（580）。 基板和测量光学系统以第一速度（vW）相对于彼此移动，以便以第二速度（vSPOT）同步地相对于测量光学系统的参考系（RF）移动辐射点来扫描标记 ）。 该点以低于第一速度的第三速度（vEFF）扫描标记，以允许更多时间获取准确的位置测量。 在一个实施例中，物镜（524）相对于参考框架保持固定，而移动的光学元件（562）相对于参考框架赋予辐射点的移动。
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3.发明申请LITHOGRAPHIC APPARATUS, METHOD OF DEFORMING A SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD 有权光刻装置，基板的变形方法及装置的制造方法公开(公告)号：US20120327386A1
公开(公告)日：2012-12-27
申请号：US13494638
申请日：2012-06-12
Applicant: Yang-Shan Huang , Hans Butler , Jan Van Eijk , Sven Antoin Johan Hol , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robbert Edgar Van Leeuwen
Inventor： Yang-Shan Huang , Hans Butler , Jan Van Eijk , Sven Antoin Johan Hol , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robbert Edgar Van Leeuwen
IPC: G03B27/58
CPC classification number: G03F7/7085 , G03F7/70783
Abstract: A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.
Abstract translation: 光刻设备包括投影系统，衬底台，多个传感器，致动器和控制器。 投影系统被配置为将图案化的辐射束投射到衬底上。 衬底台被配置为支撑衬底并相对于投影系统移动。 多个传感器被配置成测量衬底台的变形。 致动器构造成使基板台变形。 控制器被配置成基于由传感器进行的测量来控制致动器使基板台变形。 多个传感器位于与衬底台面对投影系统的第二侧相对的衬底台的第一侧上。 多个传感器相对于投影系统基本上是静止的。
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公开(公告)号：US20120153543A1
公开(公告)日：2012-06-21
申请号：US13296571
申请日：2011-11-15
Applicant: Johannes Petrus Martinus Bernardus Vermeulen , Antonius Franciscus Johannes De Groot , Theodorus Petrus Maria Cadee , Jeroen De Boeij
Inventor： Johannes Petrus Martinus Bernardus Vermeulen , Antonius Franciscus Johannes De Groot , Theodorus Petrus Maria Cadee , Jeroen De Boeij
CPC classification number: G03F7/70758 , G03F7/70691
Abstract: A lithography apparatus comprises a projection system arranged to transfer a pattern from a patterning device onto a substrate, a carrier, and a drive system for moving the carrier relative to the projection system in a plane defined by reference to orthogonal axes X and Y. The drive system comprises a shuttle moving parallel to the Y-axis, a shuttle connector connecting the shuttle to the carrier, the shuttle connector allowing movement of the carrier in a direction parallel to the X-axis relative to the shuttle, and a shuttle driver for driving movement of the shuttle parallel to the Y-axis. The shuttle is located to one side of the carrier in a direction parallel to the X-axis and it is desirable if only one of the shuttle is connected to the carrier.
Abstract translation: 光刻设备包括投影系统，其被布置成将图案从图案形成装置传送到基板，载体和驱动系统，用于在参考正交轴线X和Y限定的平面中相对于投影系统移动载体。 驱动系统包括平行于Y轴移动的梭子，将梭子连接到托架的穿梭连接器，穿梭连接器允许托架在平行于X轴的方向上相对于梭子运动;以及穿梭驱动器， 梭子平行于Y轴的驱动运动。 梭子在平行于X轴的方向上位于载体的一侧，并且希望只有梭子之一连接到载体上。
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5.发明申请公开(公告)号：US20110299057A1
公开(公告)日：2011-12-08
申请号：US13100740
申请日：2011-05-04
Applicant: Johannes Antonius Gerardus AKKERMANS , Theodorus Petrus Maria Cadee , George Wilhelmus Johannes Clijsen
Inventor： Johannes Antonius Gerardus AKKERMANS , Theodorus Petrus Maria Cadee , George Wilhelmus Johannes Clijsen
IPC: G03B27/58
CPC classification number: G03F7/70725 , G03F7/70991
Abstract: A stage apparatus to position an object, the stage apparatus including a table configured to hold the object, a support structure configured to support the table, the table being displaceable relative to the support structure, the support structure including one of a first data clock and a second data clock and the table including the other one of the first data clock and the second data clock; and a circuit configured to synchronize the first and second data clocks, the circuit including a transmitter and receiver, the transmitter configured to wirelessly transmit clock signal data from the first data clock to the second data clock, and a synchronization circuit configured to synchronize the second data clock with the first data clock from the wirelessly transmitted clock signal data received by the receiver.
Abstract translation: 一种用于定位物体的舞台装置，舞台装置包括被配置为保持对象的桌子，被配置为支撑桌子的支撑结构，桌子可相对于支撑结构移动，支撑结构包括第一数据时钟和 第二数据时钟和包括第一数据时钟和第二数据时钟中的另一个的表; 以及电路，被配置为使所述第一和第二数据时钟同步，所述电路包括发射机和接收机，所述发射机被配置为将时钟信号数据从所述第一数据时钟无线传输到所述第二数据时钟;以及同步电路， 数据时钟具有来自接收机接收的无线传输时钟信号数据的第一个数据时钟。
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Patent Agency Ranking
公开(公告)号：US20110280703A1
公开(公告)日：2011-11-17
申请号：US13081919
申请日：2011-04-07
Applicant: Theodorus Petrus Maria CADEE , Koen Jacobus Johannes Maria ZAAL , Timo HOL , Michael Wilhelmus Theodorus KOOT
Inventor： Theodorus Petrus Maria CADEE , Koen Jacobus Johannes Maria ZAAL , Timo HOL , Michael Wilhelmus Theodorus KOOT
IPC: H01L21/673 , G03B27/58
CPC classification number: H01L21/68785 , G03F7/7075 , H01L21/6838
Abstract: An apparatus configured to handle an object in a contactless manner, the apparatus includes a carrying body having a carrying surface which is configured to be directed towards the object, the carrying surface being provided with a plurality of traction members and a plurality of overpressure members, each overpressure member being provided with at least one exhaust opening, each traction member being provided with an indentation and at least two suction openings that are arranged in the indentation, the at least two suction openings of each traction member being configured to generate a pressure gradient between them so as to create a traction fluid flow in the indentation in a direction substantially parallel to the carrying surface; and a pressure controller configured to control the pressure gradient between the at least two suction openings of each traction member
Abstract translation: 一种被配置为以非接触方式处理物体的装置，该装置包括：承载体，其具有构造成朝向物体的承载表面，承载表面设置有多个牵引构件和多个超压构件， 每个超压构件设置有至少一个排气口，每个牵引构件设置有凹陷和布置在凹陷中的至少两个抽吸开口，每个牵引构件的至少两个抽吸孔构造成产生压力梯度 在它们之间以在基本上平行于承载表面的方向上在压痕中产生牵引流体流动; 以及压力控制器，被配置为控制每个牵引构件的至少两个吸入口之间的压力梯度
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公开(公告)号：US07696492B2
公开(公告)日：2010-04-13
申请号：US11637936
申请日：2006-12-13
Applicant: Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailovitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer
Inventor： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailovitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer
CPC classification number: G03F7/70933 , G03F7/70858 , G03F7/70883 , G03F7/70916 , G03F7/70925 , G03F7/70983 , H05G2/003 , H05G2/005
Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.
Abstract translation: 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。
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公开(公告)号：US07304715B2
公开(公告)日：2007-12-04
申请号：US10917535
申请日：2004-08-13
Applicant: Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov
Inventor： Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov
CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.
Abstract translation: 公开了一种光刻设备。 该装置包括配置成调节辐射束的照明系统和构造成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述设备还包括被构造成保持基板的基板台，配置成将图案化的辐射束投影到基板的目标部分上的投影系统，配置成至少部分地填充投影系统和基板之间的空间的液体供应系统 具有液体，被布置成基本上容纳空间内的液体的密封构件以及用于控制和/或补偿浸没液体从基底蒸发的元件。
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9.发明授权Lithographic apparatus, method of deforming a substrate table and device manufacturing method 有权平版印刷装置，基板台的变形方法及装置的制造方法公开(公告)号：US09329501B2
公开(公告)日：2016-05-03
申请号：US13494638
申请日：2012-06-12
Applicant: Yang-Shan Huang , Hans Butler , Jan Van Eijk , Sven Antoin Johan Hol , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robbert Edgar Van Leeuwen
Inventor： Yang-Shan Huang , Hans Butler , Jan Van Eijk , Sven Antoin Johan Hol , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robbert Edgar Van Leeuwen
CPC classification number: G03F7/7085 , G03F7/70783
Abstract: A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.
Abstract translation: 光刻设备包括投影系统，衬底台，多个传感器，致动器和控制器。 投影系统被配置为将图案化的辐射束投射到衬底上。 衬底台被配置为支撑衬底并相对于投影系统移动。 多个传感器被配置成测量衬底台的变形。 致动器构造成使基板台变形。 控制器被配置成基于由传感器进行的测量来控制致动器使基板台变形。 多个传感器位于与衬底台面对投影系统的第二侧相对的衬底台的第一侧上。 多个传感器相对于投影系统基本上是静止的。
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10.发明授权公开(公告)号：US09188880B2
公开(公告)日：2015-11-17
申请号：US13288831
申请日：2011-11-03
Applicant: Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
Inventor： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC: G03F7/20
CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
Abstract translation: 描述了一种光刻设备，其具有液体供应系统，其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳空间内的液体的阻挡构件和加热器。
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