发明授权
US08916804B2 Heat treatment method, recording medium having recorded program for executing heat treatment method, and heat treatment apparatus
有权
热处理方法，具有用于执行热处理方法的记录程序的记录介质和热处理装置
- 专利标题： Heat treatment method, recording medium having recorded program for executing heat treatment method, and heat treatment apparatus
- 专利标题（中）： 热处理方法，具有用于执行热处理方法的记录程序的记录介质和热处理装置
-
申请号： US13192018申请日： 2011-07-27
-
公开(公告)号： US08916804B2公开(公告)日： 2014-12-23
- 发明人: Kenichi Shigetomi
- 申请人： Kenichi Shigetomi
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Abelman, Frayne & Schwab
- 优先权： JP2010-178855 20100809
- 主分类号： H05B1/02
- IPC分类号： H05B1/02 ; H01L21/67 ; H01L21/687
摘要：
Provided is a thermal processing method including a first process comprising changing a set temperature of the heating plate from a first temperature to a second temperature; initiating a thermal processing for a first substrate before the temperature of the heating plate reaches the second temperature; obtaining temperature data of the heating plate after the thermal processing is initiated; changing the set temperature of the heating plate from the second temperature when the set temperature reaches the second temperature; and thermal processing of the first substrate using the heating plate for which the set temperature has been changed. The method further includes a second process comprising reinstating the temperature of the heating plate to the second temperature after the thermal processing of the first substrate; and thermal processing of a next substrate using the heating plate while the temperature of the heating plate is maintained at the second temperature.
公开/授权文献
信息查询
