发明授权
- 专利标题： Photoresist comprising nitrogen-containing compound
- 专利标题（中）： 包含含氮化合物的光致抗蚀剂
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申请号： US13013780申请日： 2011-01-25
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公开(公告)号： US08927190B2公开(公告)日： 2015-01-06
- 发明人: Cong Liu , Chunyi Wu , Gerhard Pohlers , Gregory P. Prokopowicz , Cheng-Bai Xu
- 申请人： Cong Liu , Chunyi Wu , Gerhard Pohlers , Gregory P. Prokopowicz , Cheng-Bai Xu
- 申请人地址： US MA Marlborough
- 专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人地址： US MA Marlborough
- 代理机构： Edwards Wildman Palmer LLP
- 代理商 Peter F. Corless
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/26 ; C07C261/00
摘要：
New nitrogen-containing compounds are provided that comprise multiple hydroxyl moieties and photoresist compositions that comprise such nitrogen-containing compounds. Preferred nitrogen-containing compounds comprise 1) multiple hydroxyl substituents (i.e. 2 or more) and 2) one or more photoacid-labile groups.
公开/授权文献
- US20110223535A1 PHOTORESIST COMPRISING NITROGEN-CONTAINING COMPOUND 公开/授权日：2011-09-15