Invention Grant
- Patent Title: P-type metal oxide semiconductor
- Patent Title (中): P型金属氧化物半导体
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Application No.: US14039188Application Date: 2013-09-27
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Publication No.: US08927986B2Publication Date: 2015-01-06
- Inventor: Tzu-Chi Chou , Kuo-Chuang Chiu , Show-Ju Peng , Shan-Haw Chiou , Yu-Tsz Shie
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: TW101135764A 20120928
- Main IPC: H01L29/10
- IPC: H01L29/10 ; H01L29/12

Abstract:
The disclosure provides a p-type metal oxide semiconductor material. The p-type metal oxide semiconductor material has the following formula: In1−xGa1−yMx+yZnO4+m, wherein M is Ca, Mg, or Cu, 0
Public/Granted literature
- US20140091302A1 P-TYPE METAL OXIDE SEMICONDUCTOR MATERIAL THING Public/Granted day:2014-04-03
Information query
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