Invention Grant
US08927995B2 Thin film transistor with anti-diffusion area that prevents metal atoms and/or ions from source/drain electrodes from shortening the channel length and display substrate having the thin film transistor
有权
具有防扩散区域的薄膜晶体管,其防止源极/漏极的金属原子和/或离子缩短沟道长度,并且具有薄膜晶体管的显示衬底
- Patent Title: Thin film transistor with anti-diffusion area that prevents metal atoms and/or ions from source/drain electrodes from shortening the channel length and display substrate having the thin film transistor
- Patent Title (中): 具有防扩散区域的薄膜晶体管,其防止源极/漏极的金属原子和/或离子缩短沟道长度,并且具有薄膜晶体管的显示衬底
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Application No.: US11581619Application Date: 2006-10-16
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Publication No.: US08927995B2Publication Date: 2015-01-06
- Inventor: Hong Koo Lee , Sang Hoon Jung
- Applicant: Hong Koo Lee , Sang Hoon Jung
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Brinks Gilson & Lione
- Priority: KR10-2006-0043247 20060515; KR10-2006-0088989 20060914
- Main IPC: H01L27/14
- IPC: H01L27/14 ; H01L29/04 ; H01L29/15 ; H01L31/036 ; H01L29/76 ; H01L29/417 ; H01L29/08 ; H01L29/786 ; H01L29/06

Abstract:
A thin film transistor includes a semiconductor pattern disposed on a substrate and a semiconductor pattern portion with a conductive or nonconductive characteristic, and a anti-diffusion portion on a side of the semiconductor pattern portion to prevent metal ions from being diffused along the semiconductor pattern portion. A first insulating layer covers the semiconductor pattern and has a first contact hole exposing a first region of the semiconductor pattern portion and a second contact hole exposing a second region of the semiconductor pattern portion. A gate electrode is disposed on the first insulating layer. A second insulating layer covers the gate electrode and has a third contact hole exposing the first region and a fourth contact hole exposing the second region. A source electrode is formed on the second insulating layer and connected to the first region, and a drain electrode is formed on the second insulating layer and connected to the second region.
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