发明授权
- 专利标题： Surface defect inspection method and apparatus
- 专利标题（中）： 表面缺陷检查方法及装置
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申请号： US13838460申请日： 2013-03-15
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公开(公告)号： US08934092B2公开(公告)日： 2015-01-13
- 发明人: Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
- 申请人： Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
- 申请人地址： JP Tokyo
- 专利权人： Hitachi High-Technologies Corporation
- 当前专利权人： Hitachi High-Technologies Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Antonelli, Terry, Stout & Kraus, LLP.
- 优先权： JP2007-115004 20070425; JP2007-156385 20070613
- 主分类号： G01N21/00
- IPC分类号： G01N21/00 ; G01N21/88
摘要：
A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and wherein irradiating the beam includes performing a line illumination of the beam on a line illumination region of the sample surface. The line illumination region is moved in a longitudinal direction at a pitch shorter than a length of the line illumination region in the longitudinal direction.
公开/授权文献
- US20130208271A1 SURFACE DEFECT INSPECTION METHOD AND APPARATUS 公开/授权日：2013-08-15