发明授权
- 专利标题： High contrast alignment marks through multiple stage imprinting
- 专利标题（中）： 高对比度对准标记通过多级压印
-
申请号： US13245288申请日： 2011-09-26
-
公开(公告)号： US08935981B2公开(公告)日： 2015-01-20
- 发明人: Joseph Michael Imhof , Kosta S. Selinidis , Dwayne L. LaBrake
- 申请人： Joseph Michael Imhof , Kosta S. Selinidis , Dwayne L. LaBrake
- 申请人地址： US TX Austin
- 专利权人： Canon Nanotechnologies, Inc.
- 当前专利权人： Canon Nanotechnologies, Inc.
- 当前专利权人地址： US TX Austin
- 代理商 Cameron A. King
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; B82Y40/00
摘要：
Two-stage imprinting techniques capable of protecting fine patterned features of an imprint lithography template are herein described. In particular, such techniques may be used during fabrication of recessed high-contrast alignment marks for preventing deposited metal layers from coming into contact with fine features etched into the template.
公开/授权文献
信息查询
