Invention Grant
- Patent Title: Laser crystallization apparatus and method for manufacturing thin film transistor array panel using the same
- Patent Title (中): 激光结晶装置及使用其制造薄膜晶体管阵列面板的方法
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Application No.: US13761276Application Date: 2013-02-07
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Publication No.: US08952289B2Publication Date: 2015-02-10
- Inventor: Byoung-Kwon Choo , Cheol-Ho Park , Kwon-Hyung Lee , Sung-Chul Pyo
- Applicant: Byoung-Kwon Choo , Cheol-Ho Park , Kwon-Hyung Lee , Sung-Chul Pyo
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2012-0042651 20120424
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/67 ; H01L21/02 ; B23K26/06
Abstract:
Laser crystallization equipment includes a laser generator generating a laser beam, the laser beam being directed toward a processing target substrate, and a blade member over the processing target substrate, the blade member being configured to chop the laser beam with a predetermined width in two directions, wherein two ends of the laser beam chopped by the blade member are irradiated to the processing target substrate as diffraction light.
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