Invention Grant
- Patent Title: Electromagnetic lens for electron beam exposure apparatus
- Patent Title (中): 用于电子束曝光装置的电磁透镜
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Application No.: US14090943Application Date: 2013-11-26
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Publication No.: US08957389B2Publication Date: 2015-02-17
- Inventor: Akio Yamada
- Applicant: Advantest Corporation
- Applicant Address: JP Tokyo
- Assignee: Advantest Corp.
- Current Assignee: Advantest Corp.
- Current Assignee Address: JP Tokyo
- Agency: Muramatsu & Associates
- Priority: JP2012-273068 20121214
- Main IPC: H01J37/141
- IPC: H01J37/141

Abstract:
There is provided an electromagnetic lens which includes an electromagnetic coil wound to be rotationally symmetrical about an optical axis of an electron beam, and a pole piece covering the electromagnetic coil, in which: a gap is integrally formed in either one of an inner wall formed at an inner circumference side of the pole piece and a lower end wall formed in an end portion at an emission side of the electron beam, or a boundary portion between the two walls; the inner wall is formed to be thinnest at a portion close to the gap and to gradually become thicker as a distance from the gap increases; and the electromagnetic lens is formed such that a width in a radial direction thereof is more increased as being closer to the gap along with the change of the thickness of the inner wall.
Public/Granted literature
- US20140166893A1 ELECTROMAGNETIC LENS FOR ELECTRON BEAM EXPOSURE APPARATUS Public/Granted day:2014-06-19
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