Invention Grant
- Patent Title: Thin film transistor substrate and method of manufacturing the same
- Patent Title (中): 薄膜晶体管基板及其制造方法
-
Application No.: US13755730Application Date: 2013-01-31
-
Publication No.: US08963154B2Publication Date: 2015-02-24
- Inventor: Sang-Ho Park , Su-Hyoung Kang , Dong-Hwan Shim , Yoon-Ho Khang , Se-Hwan Yu , Min-Jung Lee , Yong-Su Lee
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2012-0087597 20120810
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L29/10 ; H01L29/786 ; H01L29/66

Abstract:
A thin film transistor substrate includes a base substrate, an active pattern disposed on the base substrate, a gate insulation pattern disposed on the active pattern, a gate electrode disposed on the gate insulation pattern and overlapping the channel, and a light-blocking pattern disposed between the base substrate and the active pattern and having a size greater than the active pattern. The active pattern includes a source electrode, a drain electrode, and a channel disposed between the source electrode and the drain electrode.
Public/Granted literature
- US20140042429A1 THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2014-02-13
Information query
IPC分类: