Invention Grant
- Patent Title: Multi charged particle beam writing method, and multi charged particle beam writing apparatus
- Patent Title (中): 多带电粒子束写入方法和多带电粒子束写入装置
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Application No.: US14297030Application Date: 2014-06-05
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Publication No.: US08969837B2Publication Date: 2015-03-03
- Inventor: Hiroshi Matsumoto
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2013-121717 20130610
- Main IPC: G21K1/087
- IPC: G21K1/087 ; H01J37/317 ; G21K5/04

Abstract:
A multi charged particle beam writing method includes dividing a maximum irradiation time per a shot into a digit number of first irradiation time periods, each of which is calculated by multiplying a corresponding second gray scale value by the quantization unit, where second gray scale values are gray scale values defined in decimal numbers converted from each digit value of data of binary numbers; dividing second irradiation time periods, which are a part of the first irradiation time periods into third irradiation time periods; dividing irradiation of each beam into the first irradiation steps of the third irradiation time periods and second irradiation steps of the remaining undivided first irradiation time periods; and irradiating a target object, in order, with the multi beams such that the groups are respectively composed of combination of at least two irradiation steps of first irradiation steps and second irradiation steps and the groups continue in order.
Public/Granted literature
- US20140361193A1 MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS Public/Granted day:2014-12-11
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