Invention Grant
US08981534B2 Pre-cutting a back side of a silicon substrate for growing better III-V group compound layer on a front side of the substrate
有权
预切割硅衬底的背面,以在衬底的正面上生长更好的III-V族化合物层
- Patent Title: Pre-cutting a back side of a silicon substrate for growing better III-V group compound layer on a front side of the substrate
- Patent Title (中): 预切割硅衬底的背面,以在衬底的正面上生长更好的III-V族化合物层
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Application No.: US13616415Application Date: 2012-09-14
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Publication No.: US08981534B2Publication Date: 2015-03-17
- Inventor: Zhen-Yu Li , Chung-Pao Lin , Hsing-Kuo Hsia , Hao-Chung Kuo , Cindy Huichun Shu , Hsin-Chieh Huang
- Applicant: Zhen-Yu Li , Chung-Pao Lin , Hsing-Kuo Hsia , Hao-Chung Kuo , Cindy Huichun Shu , Hsin-Chieh Huang
- Applicant Address: TW Hsinchu
- Assignee: TSMC Solid State Lighting Ltd.
- Current Assignee: TSMC Solid State Lighting Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L29/06
- IPC: H01L29/06

Abstract:
The present disclosure involves an apparatus. The apparatus includes a substrate having a front side a back side opposite the front side. The substrate includes a plurality of openings formed from the back side of the substrate. The openings collectively define a pattern on the back side of the substrate from a planar view. In some embodiments, the substrate is a silicon substrate or a silicon carbide substrate. Portions of the silicon substrate vertically aligned with the openings have vertical dimensions that vary from about 100 microns to about 300 microns. A III-V group compound layer is formed over the front side of the silicon substrate. The III-V group compound layer is a component of one of: a light-emitting diode (LED), a laser diode (LD), and a high-electron mobility transistor (HEMT).
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