发明授权
- 专利标题: Microscope system and illumination intensity adjusting method
- 专利标题(中): 显微镜系统和照明强度调节方法
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申请号: US13615561申请日: 2012-09-13
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公开(公告)号: US08982457B2公开(公告)日: 2015-03-17
- 发明人: Yosuke Tani
- 申请人: Yosuke Tani
- 申请人地址: JP Tokyo
- 专利权人: Olympus Corporation
- 当前专利权人: Olympus Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Holtz, Holtz, Goodman & Chick PC
- 优先权: JP2011-211433 20110927
- 主分类号: G02B21/10
- IPC分类号: G02B21/10 ; G02B21/12
摘要:
A microscope system and an illumination intensity adjusting method that can automatically adjust an illumination intensity when a bright-field illumination system and a dark-field illumination system are simultaneously used are provided. The microscope system includes: a stage on which a specimen is placed; an objective lens that converges observation light from at least the specimen S on the stage; a bright-field illumination unit configured to emit bright-field illumination light that is illumination light aperture to the specimen for a bright-field observation; a dark-field illumination unit configured to emit dark-field illumination light that is illumination light aperture to the specimen for a dark-field observation; and an illumination intensity control unit configured to adjust an illumination intensity of at least one of the bright-field illumination light and the dark-field illumination light according to the illumination intensity of the other one.
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