Invention Grant
- Patent Title: Method for forming solar cell with selective emitters
- Patent Title (中): 用选择性发射体形成太阳能电池的方法
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Application No.: US13165670Application Date: 2011-06-21
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Publication No.: US08987038B2Publication Date: 2015-03-24
- Inventor: Dimitre Zahariev Dimitrov , Ching-Hsi Lin , Chung-Wen Lan , Der-Chin Wu
- Applicant: Dimitre Zahariev Dimitrov , Ching-Hsi Lin , Chung-Wen Lan , Der-Chin Wu
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Priority: TW99135511A 20101019
- Main IPC: H01L31/0236
- IPC: H01L31/0236 ; H01L31/068 ; H01L31/18

Abstract:
A method for forming a solar cell with selective emitters is disclosed, including selectively removing a portion of a barrier layer on a substrate to form an opening, performing a texture etching process to the substrate to form a second texture structure in a second region under the opening of the barrier layer, wherein the substrate surface in the first region does not change from the first texture structure. The first texture structure and the second texture structure include a plurality of protruding portions and recessing portions. The distance between neighboring protruding portions of the first texture structure is L1, the distance between neighboring protruding portions of the second texture structure is L2, and L1 is 2˜20 times that of L2. The method for forming a solar cell with selective emitters further comprises removing the barrier layer and performing a doping process.
Public/Granted literature
- US20120090673A1 METHOD FOR FORMING SOLAR CELL WITH SELECTIVE EMITTERS Public/Granted day:2012-04-19
Information query
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