Invention Grant
- Patent Title: Enhanced integrity projection lens assembly
- Patent Title (中): 增强完整性投影镜头组合
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Application No.: US13722873Application Date: 2012-12-20
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Publication No.: US08987679B2Publication Date: 2015-03-24
- Inventor: Johan Joost Koning , Stijn Willem Herman Steenbrink , Bart Schipper
- Applicant: Mapper Lithography IP B.V.
- Applicant Address: NL Delft
- Assignee: Mapper Lithography IP B.V.
- Current Assignee: Mapper Lithography IP B.V.
- Current Assignee Address: NL Delft
- Agency: Blakely Sokoloff Taylor & Zafman
- Main IPC: H01J37/12
- IPC: H01J37/12 ; H01J3/18
Abstract:
The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.
Public/Granted literature
- US20140175300A1 ENHANCED INTEGRITY PROJECTION LENS ASSEMBLY Public/Granted day:2014-06-26
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