发明授权
- 专利标题: Charged particle beam drawing apparatus and charged particle beam drawing method
- 专利标题(中): 带电粒子束拉制装置和带电粒子束拉制法
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申请号: US14258371申请日: 2014-04-22
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公开(公告)号: US08987683B2公开(公告)日: 2015-03-24
- 发明人: Michihiro Kawaguchi , Kiminobu Akeno , Yoshinori Kagawa , Yu Asami , Keisuke Yamaguchi
- 申请人: NuFlare Technology, Inc.
- 申请人地址: JP Yokohama-shi
- 专利权人: NuFlare Technology, Inc.
- 当前专利权人: NuFlare Technology, Inc.
- 当前专利权人地址: JP Yokohama-shi
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2013-093686 20130426
- 主分类号: H01L21/02
- IPC分类号: H01L21/02 ; G21K5/08 ; H01J37/30 ; H01J37/18
摘要:
A charged particle beam drawing apparatus according to one embodiment of the present invention comprises a load lock chamber provided for introducing a target object from the outside and capable of switching an atmosphere state and a vacuum state, a transfer chamber arranged so as to be able to communicate with the load lock chamber and transferring the target object, a soaking chamber arranged so as to be able to communicate with the transfer chamber and having a temperature adjustment container for housing the target object therein and controlling a temperature of the target object with radiation and a temperature adjustment part for controlling a temperature of the temperature adjustment container, and a drawing chamber arranged so as to be able to communicate with the transfer chamber and drawing on the target object at a constant temperature.
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