Invention Grant
- Patent Title: Method and system to reduce outgassing in a reaction chamber
- Patent Title (中): 减少反应室排气的方法和系统
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Application No.: US13941134Application Date: 2013-07-12
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Publication No.: US08993054B2Publication Date: 2015-03-31
- Inventor: Sung-Hoon Jung , Petri Raisanen , Eric Jen Cheng Liu , Mike Schmotzer
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Snell & Wilmer LLP
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/44 ; C23C16/455

Abstract:
Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system.
Public/Granted literature
- US20150017319A1 METHOD AND SYSTEM TO REDUCE OUTGASSING IN A REACTION CHAMBER Public/Granted day:2015-01-15
Information query
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