发明授权
US08999104B2 Systems, methods and apparatus for separate plasma source control
有权
用于单独等离子体源控制的系统，方法和装置
- 专利标题： Systems, methods and apparatus for separate plasma source control
- 专利标题（中）： 用于单独等离子体源控制的系统，方法和装置
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申请号： US12852364申请日： 2010-08-06
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公开(公告)号： US08999104B2公开(公告)日： 2015-04-07
- 发明人: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
- 申请人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
- 申请人地址： US CA Fremont
- 专利权人： Lam Research Corporation
- 当前专利权人： Lam Research Corporation
- 当前专利权人地址： US CA Fremont
- 代理机构： Martine Penilla Group, LLP
- 主分类号： C23F1/00
- IPC分类号： C23F1/00 ; H01J37/32
摘要：
A plasma source includes multiple ring plasma chambers, multiple primary windings, multiple ferrites and a control system. Each one of the primary windings is wrapped around an exterior one of the ring plasma chambers. Each one of the plurality of the ring plasma chamber passes through a respective portion of the plurality of ferrites. The control system is coupled to each of the ring plasma chambers. A system and method for generating and using a plasma are also described.
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