Invention Grant
US08999492B2 Method to produce nanometer-sized features with directed assembly of block copolymers
有权
通过嵌段共聚物的定向组装制备纳米尺寸特征的方法
- Patent Title: Method to produce nanometer-sized features with directed assembly of block copolymers
- Patent Title (中): 通过嵌段共聚物的定向组装制备纳米尺寸特征的方法
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Application No.: US12026214Application Date: 2008-02-05
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Publication No.: US08999492B2Publication Date: 2015-04-07
- Inventor: Dan B. Millward , Gurtej S. Sandhu
- Applicant: Dan B. Millward , Gurtej S. Sandhu
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: G03G7/00
- IPC: G03G7/00 ; B05D5/02 ; C08F2/46 ; C03C25/68 ; G03F7/00 ; B81C99/00 ; B82Y10/00 ; B05D1/28 ; B82Y30/00 ; B82Y40/00
Abstract:
Methods for fabricating stamps and systems for patterning a substrate, and devices resulting from those methods are provided.
Public/Granted literature
- US20100316849A1 Method to Produce Nanometer-Sized Features with Directed Assembly of Block Copolymers Public/Granted day:2010-12-16
Information query
