发明授权
US09000005B2 Highly pure pyrroloquinolinyl-pyrrole-2,5-dione and pyrroloquinolinyl-pyrrolidine-2,5-dione and methods of preparing same
有权
高纯吡咯并喹啉基 - 吡咯-2,5-二酮和吡咯并喹啉基 - 吡咯烷-2,5-二酮及其制备方法
- 专利标题： Highly pure pyrroloquinolinyl-pyrrole-2,5-dione and pyrroloquinolinyl-pyrrolidine-2,5-dione and methods of preparing same
- 专利标题（中）： 高纯吡咯并喹啉基 - 吡咯-2,5-二酮和吡咯并喹啉基 - 吡咯烷-2,5-二酮及其制备方法
-
申请号： US13788271申请日： 2013-03-07
-
公开(公告)号： US09000005B2公开(公告)日： 2015-04-07
- 发明人: Yoshitaka Nakamura , Jo Ooyama
- 申请人： ArQule, Inc.
- 申请人地址： US MA Woburn
- 专利权人： ArQule, Inc.
- 当前专利权人： ArQule, Inc.
- 当前专利权人地址： US MA Woburn
- 代理机构： Cooley LLP
- 代理商 Ivor R. Elrifi; Matthew Pavao
- 主分类号： C07D471/06
- IPC分类号： C07D471/06 ; C07D451/00 ; C07D453/00 ; C07D455/00 ; A61K31/473
摘要：
The present invention relates to highly-pure pyrroloquinolinyl-pyrrole-2,5-dione and pyrroloquinolinyl-pyrrolidine-2,5-dione, for example, 3-(5,6-dihydro-4H-pyrrolo[3,2,1-ij]quinolin-1-yl)-4-(1H-indol-3-yl)-1H-pyrrole-2,5-dione, 3-(5,6-dihydro-4H-pyrrolo[3,2,1-ij]quinolin-1-yl)-4-(1H-indol-3-yl)pyrrolidine-2,5-dione, and pharmaceutically acceptable salts, solvates, and diastereomers thereof. The present invention also relates to methods for preparing highly-pure pyrroloquinolinyl-pyrrole-2,5-dione and pyrroloquinolinyl-pyrrolidine-2,5-dione, for example, 3-(5,6-dihydro-4H-pyrrolo[3,2,1-ij]quinolin-1-yl)-4-(1H-indol-3-yl)-1H-pyrrole-2,5-dione, 3-(5,6-dihydro-4H-pyrrolo[3,2,1-ij]quinolin-1-yl)-4-(1H-indol-3-yl)pyrrolidine-2,5-dione, and pharmaceutically acceptable salts, solvates, and diastereomers thereof.
公开/授权文献
信息查询
