Invention Grant
US09001305B2 Ultra-large size flat panel display maskless photolithography system and method
有权
超大尺寸平板显示屏无掩模光刻系统及方法
- Patent Title: Ultra-large size flat panel display maskless photolithography system and method
- Patent Title (中): 超大尺寸平板显示屏无掩模光刻系统及方法
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Application No.: US13648944Application Date: 2012-10-10
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Publication No.: US09001305B2Publication Date: 2015-04-07
- Inventor: Wenhui Mei , Weichong Du , Lujie Qu
- Applicant: Wenhui Mei , Weichong Du , Lujie Qu
- Priority: CN201210363540 20120926
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/58 ; G03F7/20

Abstract:
A maskless exposure system that has multiple maskless optical engines arranged in an (N×M) matrix that form and project a pattern onto a substrate. A first stage system is capable of driving the maskless optical engines in a first direction, a second stage system capable of holding and moving the substrate in a second direction perpendicular to the first direction. A control system that processes data and synchronizing movement of the first and second stage systems and a vision system that detects the positions of the second stage system to synchronize movements with the multiple optical engines.
Public/Granted literature
- US20130088704A1 Ultra-Large Size Flat Panel Display Maskless Photolithography System and Method Public/Granted day:2013-04-11
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