Invention Grant
US09001305B2 Ultra-large size flat panel display maskless photolithography system and method 有权
超大尺寸平板显示屏无掩模光刻系统及方法

Ultra-large size flat panel display maskless photolithography system and method
Abstract:
A maskless exposure system that has multiple maskless optical engines arranged in an (N×M) matrix that form and project a pattern onto a substrate. A first stage system is capable of driving the maskless optical engines in a first direction, a second stage system capable of holding and moving the substrate in a second direction perpendicular to the first direction. A control system that processes data and synchronizing movement of the first and second stage systems and a vision system that detects the positions of the second stage system to synchronize movements with the multiple optical engines.
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