发明授权
US09018615B2 Resistor random access memory structure having a defined small area of electrical contact
有权
电阻随机存取存储器结构具有限定的小的电接触面积
- 专利标题: Resistor random access memory structure having a defined small area of electrical contact
- 专利标题(中): 电阻随机存取存储器结构具有限定的小的电接触面积
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申请号: US11833563申请日: 2007-08-03
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公开(公告)号: US09018615B2公开(公告)日: 2015-04-28
- 发明人: Erh-Kun Lai , ChiaHua Ho , Kuang Yeu Hsieh
- 申请人: Erh-Kun Lai , ChiaHua Ho , Kuang Yeu Hsieh
- 申请人地址: TW Hsinchu
- 专利权人: Macronix International Co., Ltd.
- 当前专利权人: Macronix International Co., Ltd.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Haynes Beffel & Wolfeld LLP
- 主分类号: H01L47/00
- IPC分类号: H01L47/00 ; H01L45/00
摘要:
A memory cell device, of the type that includes a memory material switchable between electrical property states by application of energy, includes first and second electrodes, a plug of memory material (such as phase change material) which is in electrical contact with the second electrode, and an electrically conductive film which is supported by a dielectric form and which is in electrical contact with the first electrode and with the memory material plug. The dielectric form is wider near the first electrode, and is narrower near the phase change plug. The area of contact of the conductive film with the phase change plug is defined in part by the geometry of the dielectric form over which the conductive film is formed. Also, methods for making the device include steps of constructing a dielectric form over a first electrode, and forming a conductive film over the dielectric form.
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