Invention Grant
- Patent Title: Lithographic apparatus
- Patent Title (中): 平版印刷设备
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Application No.: US12423528Application Date: 2009-04-14
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Publication No.: US09036127B2Publication Date: 2015-05-19
- Inventor: Clemens Johannes Gerardus Van den Dungen , Nicolaas Franciscus Koppelaars , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Marcel Beckers , Richard Moerman , Cédric Désiré Grouwstra , Danny Maria Hubertus Philips , Remko Jan Peter Verhees , Pieter Mulder , Evert Van Vliet
- Applicant: Clemens Johannes Gerardus Van den Dungen , Nicolaas Franciscus Koppelaars , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Marcel Beckers , Richard Moerman , Cédric Désiré Grouwstra , Danny Maria Hubertus Philips , Remko Jan Peter Verhees , Pieter Mulder , Evert Van Vliet
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
Public/Granted literature
- US20090262318A1 LITHOGRAPHIC APPARATUS Public/Granted day:2009-10-22
Information query
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