发明授权
- 专利标题： Polishing composition for nickel-phosphorous-coated memory disks
- 专利标题（中）： 镍 - 磷涂层记录盘抛光组合物
-
申请号： US13478292申请日： 2012-05-23
-
公开(公告)号： US09039914B2公开(公告)日： 2015-05-26
- 发明人: Selvaraj Palanisamy Chinnathambi , Haresh Siriwardane
- 申请人： Selvaraj Palanisamy Chinnathambi , Haresh Siriwardane
- 申请人地址： US IL Aurora
- 专利权人： Cabot Microelectronics Corporation
- 当前专利权人： Cabot Microelectronics Corporation
- 当前专利权人地址： US IL Aurora
- 代理商 Thomas E Omholt; Francis J Koszyk
- 主分类号： B44C1/22
- IPC分类号： B44C1/22 ; C09K3/14 ; H01L21/321 ; H01L21/306
摘要：
The invention provides a chemical-mechanical polishing composition containing wet-process silica, an oxidizing agent that oxidizes nickel-phosphorous, a chelating agent, polyvinyl alcohol, and water. The invention also provides a method of chemically-mechanically polishing a substrate, especially a nickel-phosphorous substrate, by contacting a substrate with a polishing pad and the chemical-mechanical polishing composition, moving the polishing pad and the polishing composition relative to the substrate, and abrading at least a portion of the substrate to polish the substrate.
公开/授权文献
信息查询
