发明授权
- 专利标题: Electrochemical etching apparatus
- 专利标题(中): 电化学蚀刻装置
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申请号: US13618564申请日: 2012-09-14
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公开(公告)号: US09062389B2公开(公告)日: 2015-06-23
- 发明人: Shu-Jen Han , Lian Guo , Xuesong Li
- 申请人: Shu-Jen Han , Lian Guo , Xuesong Li
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Cantor Colburn LLP
- 代理商 Vazken Alexanian
- 主分类号: C25F7/00
- IPC分类号: C25F7/00 ; C25F5/00 ; B32B38/10 ; C25F3/02 ; C01B31/04
摘要:
An electroplating etching apparatus includes a power supply to output current, and a container configured to contain an electrolyte. A cathode is coupled to the container and configured to fluidly communicate with the electrolyte. An anode is electrically connected to the output, and includes a graphene layer. A metal substrate layer is formed on the graphene layer, and is etched from the graphene layer in response to the current flowing through the anode.
公开/授权文献
- US20140076738A1 ELECTROCHEMICAL ETCHING APPARATUS 公开/授权日:2014-03-20
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