Invention Grant
- Patent Title: Mask having assist pattern
- Patent Title (中): 面具有辅助图案
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Application No.: US13835567Application Date: 2013-03-15
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Publication No.: US09069258B2Publication Date: 2015-06-30
- Inventor: Bong-Yeon Kim , Min Kang , Seung-Bo Shim , Jong-kwang Lee , Jin-Ho Ju , Jeong-Won Kim , Tae-Gyun Kim , Chul-Won Park , Jun-Hyuk Woo , Hyun-Joo Lee
- Applicant: Samsung Display Co., LTD.
- Applicant Address: KR
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2012-0054485 20120522
- Main IPC: G03F1/42
- IPC: G03F1/42
Abstract:
A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the circuit area.
Public/Granted literature
- US20130316270A1 MASK HAVING ASSIST PATTERN Public/Granted day:2013-11-28
Information query
