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公开(公告)号：US10529751B2
公开(公告)日：2020-01-07
申请号：US16135003
申请日：2018-09-19
发明人： Seung-Bo Shim , Jun-Gi Kim , Yong-Jun Park , Yang-Ho Jung , Jin-Ho Ju
摘要： An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.
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公开(公告)号：US09869027B2
公开(公告)日：2018-01-16
申请号：US15134672
申请日：2016-04-21
发明人： Bong-Yeon Kim , Jin-Ho Ju , Jun-Hyuk Woo , Jung-Hwan Song , Seok-Ho Lee , Seong-Sik Jeon , Jong-Su Han
IPC分类号： C09K13/04 , C23F1/16 , C11D11/00 , H01L21/02 , H05K3/26 , C11D7/32 , C11D7/26 , C11D7/08 , C11D7/06 , C23F11/04 , H05K3/06 , H05K1/03 , H05K3/38
CPC分类号： C23F1/16 , C11D7/06 , C11D7/08 , C11D7/265 , C11D7/3209 , C11D7/3245 , C11D11/0047 , C23F11/04 , H01L21/02068 , H05K1/0306 , H05K3/064 , H05K3/26 , H05K3/388 , H05K2201/0317 , H05K2201/0341 , H05K2203/124 , H05K2203/125
摘要： A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.
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3.发明授权Resin composition, method of manufacturing display apparatus by using the same, and display apparatus manufactured by using the method 有权树脂组合物，使用该方法制造显示装置的方法以及使用该方法制造的显示装置公开(公告)号：US09567483B2
公开(公告)日：2017-02-14
申请号：US14513075
申请日：2014-10-13
发明人： Koichi Sugitani , Hoon Kang , Jae-Sung Kim , Jin-Ho Ju , Jin-Young Choi
IPC分类号： C09D167/00 , G02B5/20 , G02F1/1341
CPC分类号： C09D167/00 , G02B5/201 , G02F1/1341
摘要： A method of manufacturing a display apparatus and a display apparatus manufactured by using (utilizing) the method.
摘要翻译： 一种制造使用（利用）该方法制造的显示装置和显示装置的方法。
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4.发明授权公开(公告)号：US09340759B2
公开(公告)日：2016-05-17
申请号：US14264193
申请日：2014-04-29
发明人： Bong-Yeon Kim , Jin-Ho Ju , Jun-Hyuk Woo , Jung-Hwan Song , Seok-Ho Lee , Seong-Sik Jeon , Jong-Su Han
IPC分类号： C09K13/04 , C11D11/00 , H01L21/02 , H05K3/26 , C11D7/32 , C11D7/26 , C11D7/08 , C11D7/06 , H05K3/06 , H05K1/03 , H05K3/38
CPC分类号： C23F1/16 , C11D7/06 , C11D7/08 , C11D7/265 , C11D7/3209 , C11D7/3245 , C11D11/0047 , C23F11/04 , H01L21/02068 , H05K1/0306 , H05K3/064 , H05K3/26 , H05K3/388 , H05K2201/0317 , H05K2201/0341 , H05K2203/124 , H05K2203/125
摘要： A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.
摘要翻译： 清洁组合物包含约0.01至约5重量％的螯合剂; 约0.01至约0.5重量％的有机酸; 约0.01至约1.0重量％的无机酸; 约0.01至约5重量％的碱金属化合物; 和去离子水。
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5.发明授权Photoresist composition and method of manufacturing thin film transistor substrate using the same 有权光刻胶组合物和使用其制造薄膜晶体管基板的方法公开(公告)号：US09176383B2
公开(公告)日：2015-11-03
申请号：US14531758
申请日：2014-11-03
发明人： Jeong-Won Kim , Ki-Hyun Cho , Kwang-Woo Park , Chul-Won Park , Jin-Ho Ju , Dong-Min Kim , Eun Jeagal
IPC分类号： G03F7/075 , G03F7/039 , G03F7/022 , G03F7/30 , G03F7/36 , G03F7/42 , H01L21/027 , H01L27/12 , H01L21/3213
CPC分类号： G03F7/0752 , G03F7/0048 , G03F7/022 , G03F7/0233 , G03F7/0236 , G03F7/039 , G03F7/0757 , G03F7/30 , G03F7/36 , G03F7/42 , H01L21/0271 , H01L21/0274 , H01L21/32133 , H01L21/32139 , H01L27/1288
摘要： A photoresist composition may include a novolac resin, a diazide-based photosensitive compound, a surfactant represented by Chemical Formula 1 below, and a solvent. R1 and R2 may denote a hydrogen atom or an alkyl group, x may be 10-50, and y may be 10-50.
摘要翻译： 光致抗蚀剂组合物可以包括酚醛清漆树脂，二叠氮基感光性化合物，下述化学式1表示的表面活性剂和溶剂。 R1和R2可以表示氢原子或烷基，x可以是10-50，y可以是10-50。
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公开(公告)号：US20150171118A1
公开(公告)日：2015-06-18
申请号：US14322859
申请日：2014-07-02
发明人： Seung-Bo Shim , Jin-Ho Ju , Jun-Gi Kim , Yang-Ho Jung
IPC分类号： H01L27/12
CPC分类号： H01L27/1248 , H01L27/124 , H01L27/1288
摘要： A display substrate includes a substrate having a first region and a second region, a conductive pattern is provided in the first region of the substrate and includes a first conductive pattern and a second conductive pattern, the first conductive pattern has a gate electrode and a source electrode, the second conductive pattern has a source electrode and a drain electrode, an insulation layer pattern is positioned on the conductive pattern and exposes an outer sidewall of the conductive pattern, an organic layer is provided in the first region and the second region of the substrate and covers the insulation layer pattern, and a pixel electrode is provided on the organic layer and is electrically connected to the drain electrode through a contact hole in the organic layer.
摘要翻译： 显示基板包括具有第一区域和第二区域的基板，在基板的第一区域中设置导体图案，并且包括第一导电图案和第二导电图案，第一导电图案具有栅电极和源极 电极，第二导电图案具有源电极和漏电极，绝缘层图案位于导电图案上并且暴露导电图案的外侧壁，有机层设置在第一区域和第二区域中 基板并覆盖绝缘层图案，并且在有机层上设置像素电极，并且通过有机层中的接触孔与漏电极电连接。
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7.发明申请公开(公告)号：US20140076847A1
公开(公告)日：2014-03-20
申请号：US13857554
申请日：2013-04-05
发明人： Jeong-Won Kim , Min Kang , Bong-Yeon Kim , Jin-Ho Ju , Dong-Min Kim , Tae-Gyun Kim , Joo-Kyoung Park , Chul-Won Park , Jun-Hyuk Woo , Won-Young Lee , Hyun-Joo Lee , Eun Jeagal
摘要： A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer, a mercaptopropionic acid compound and a solvent. The coating layer is exposed to a light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask.
摘要翻译： 公开了一种形成金属图案的方法。 在该方法中，在基底基板上形成金属层。 将光致抗蚀剂组合物涂覆在金属层上以形成涂层。 光致抗蚀剂组合物包括粘合剂树脂，光敏剂，巯基丙酸化合物和溶剂。 涂层被曝光。 部分去除涂层以形成光致抗蚀剂图案。 通过使用光致抗蚀剂图案作为掩模来对金属层进行构图。
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公开(公告)号：US10727257B2
公开(公告)日：2020-07-28
申请号：US16720177
申请日：2019-12-19
发明人： Seung-Bo Shim , Jun-Gi Kim , Yong-Jun Park , Yang-Ho Jung , Jin-Ho Ju
摘要： An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.
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公开(公告)号：US10338463B2
公开(公告)日：2019-07-02
申请号：US15699955
申请日：2017-09-08
发明人： Yong Son , Min Kang , Bong-Yeon Kim , Hyun-Joo Lee , Hyang-Shik Kong , Jin-Ho Ju , Kyoung-Sik Kim , Seung-Hwa Baek
摘要： A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.
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10.发明授权Complex substrate for display apparatus, display apparatus having the same and method of manufacturing the same 有权显示装置用复合基板，具有该显示装置的显示装置及其制造方法公开(公告)号：US09594206B2
公开(公告)日：2017-03-14
申请号：US14488445
申请日：2014-09-17
发明人： Yang-Ho Jung , Hoon Kang , Chul-Won Park , Jin-Ho Ju
IPC分类号： H01L21/4763 , F21V8/00 , G02B5/04 , G02B5/30 , G02B3/00 , G02F1/1335
CPC分类号： G02B6/0056 , G02B3/0037 , G02B5/045 , G02B5/3058 , G02B6/0053 , G02B6/0065 , G02F1/133528 , G02F2001/133548 , G02F2001/133565
摘要： A complex substrate for a display apparatus, the complex substrate includes a lower base substrate including convex and concave patterns, the convex and concave patterns being integral with an upper side of the lower base substrate, a planarizing layer on the lower base substrate, the planarizing layer being integral with the convex and concave patterns, and the planarizing layer having different refractivity from the lower base substrate, and a wire grid pattern on the planarizing layer, the wire grid pattern including a plurality of nano wire metal patterns, each of the nano wire metal patterns having a width of no more than a micrometer.
摘要翻译： 一种显示装置用复合基板，所述复合基板包括下基板，所述下基板包括凸凹图案，所述凸凹图案与所述下基板的上侧一体，所述下基板上的平坦化层， 层与凸形图案和凹形图案成一体，并且具有与下基底基板不同的折射率的平坦化层，以及平面化层上的线栅图案，线栅图案包括多个纳米线金属图案，每个纳米线 具有不超过千分尺的宽度的金属丝图案。
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