Invention Grant
- Patent Title: Methods for discretized processing and process sequence integration of regions of a substrate
- Patent Title (中): 离散化处理方法和基板区域的工艺顺序整合
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Application No.: US14077137Application Date: 2013-11-11
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Publication No.: US09076716B2Publication Date: 2015-07-07
- Inventor: Thomas R. Boussie , Tony P. Chiang , Alexander Gorer , David E. Lazovsky
- Applicant: Intermolecular, Inc.
- Applicant Address: US CA San Jose
- Assignee: Intermolecular, Inc.
- Current Assignee: Intermolecular, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: C40B50/00
- IPC: C40B50/00 ; H01L21/66 ; C23C14/54 ; C23C16/52 ; H01L21/67 ; H01L21/768

Abstract:
The present invention provides methods and systems for discretized, combinatorial processing of regions of a substrate such as for the discovery, implementation, optimization, and qualification of new materials, processes, and process sequence integration schemes used in integrated circuit fabrication. A substrate having an array of differentially processed regions thereon is processed by delivering materials to or modifying regions of the substrate.
Public/Granted literature
- US20140070213A1 Methods for Discretized Processing and Process Sequence Integration of Regions of a Substrate Public/Granted day:2014-03-13
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