发明授权
- 专利标题： Method and apparatus for reducing stripe patterns
- 专利标题（中）： 减少条纹图案的方法和装置
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申请号： US13371303申请日： 2012-02-10
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公开(公告)号： US09099389B2公开(公告)日： 2015-08-04
- 发明人: Chung Chien Wang , Yeur-Luen Tu , Cheng-Ta Wu , Chia-Shiung Tsai
- 申请人： Chung Chien Wang , Yeur-Luen Tu , Cheng-Ta Wu , Chia-Shiung Tsai
- 申请人地址： TW Hsin-Chu
- 专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址： TW Hsin-Chu
- 代理机构： Slater & Matsil, L.L.P.
- 主分类号： H01L21/268
- IPC分类号： H01L21/268 ; H01L27/146
摘要：
A method for reducing stripe patterns comprising receiving scattered light signals from a backside surface of a laser annealed backside illuminated image sensor wafer, generating a backside surface image based upon the scattered light signals, determining a distance between an edge of a sensor array of the laser anneal backside illuminated image sensor wafer and an adjacent boundary of a laser beam and re-calibrating the laser beam if the distance is less than a predetermined value.
公开/授权文献
- US20130210188A1 Method and Apparatus for Reducing Stripe Patterns 公开/授权日：2013-08-15