发明授权
- 专利标题: Projection lens arrangement
- 专利标题(中): 投影镜头布置
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申请号: US13304427申请日: 2011-11-25
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公开(公告)号: US09105439B2公开(公告)日: 2015-08-11
- 发明人: Marco Jan Jaco Wieland , Bert Jan Kampherbeek , Alexander Hendrik Van Veen , Pieter Kruit , Stijn Willem Steenbrink
- 申请人: Marco Jan Jaco Wieland , Bert Jan Kampherbeek , Alexander Hendrik Van Veen , Pieter Kruit , Stijn Willem Steenbrink
- 申请人地址: NL Delft
- 专利权人: MAPPER LITHOGRAPHY IP B.V.
- 当前专利权人: MAPPER LITHOGRAPHY IP B.V.
- 当前专利权人地址: NL Delft
- 代理机构: Hoyng Monegier LLP
- 代理商 David P. Owen
- 主分类号: H01J37/317
- IPC分类号: H01J37/317 ; H01J37/12 ; B82Y10/00 ; B82Y40/00 ; H01J37/30
摘要:
The invention relates to a charged particle optical system comprising a beamlet generator for generating a plurality of charged particle beamlets, an electrostatic deflection system for deflecting the beamlets, and a projection lens system for directing the beamlets from the beamlet generator towards the target. The electrostatic deflection system comprises a first electrostatic deflector and a second electrostatic deflector for scanning charged particle beamlets over the target. The second electrostatic deflector is located behind the first electrostatic deflector so that, during operation of the system, a beamlet generated by the beamlet generator passes both of the electrostatic deflectors. During operation of the first and second electrostatic deflectors the system is adapted to apply voltages on the first electrostatic deflector and the second electrostatic deflector of opposite sign.
公开/授权文献
- US20120061583A1 PROJECTION LENS ARRANGEMENT 公开/授权日:2012-03-15
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