公开(公告)号：US20080073588A1

公开(公告)日：2008-03-27

申请号：US11716452

申请日：2007-03-09

申请人： Pieter Kruit ,  Remco Jager ,  Stijn Willem Steenbrink ,  Marco Wieland

发明人： Pieter Kruit ,  Remco Jager ,  Stijn Willem Steenbrink ,  Marco Wieland

IPC分类号： H01J37/08

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70508 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31766 ,  H01J2237/31771 ,  H01L21/67282

摘要： The present invention relates a probe forming lithography system for generating an pattern on to a target surface such as a wafer, using a black and white writing strategy, i.e. writing or not writing a grid cell, thereby dividing said pattern over a grid comprising grid cells, said pattern comprising features of a size larger than that of a grid cell, in each of which cells said probe is switched “on” or “off, wherein a probe on said target covers a significantly larger surface area than a grid cell, and wherein within a feature a position dependent distribution of black and white writings is effected within the range of the probe size as well as to a method upon which such system may be based.

摘要翻译： 本发明涉及一种探针形成光刻系统，用于使用黑白写入策略（即写入或不写入网格单元）在诸如晶片的目标表面上产生图案，从而在包含网格单元的网格上划分所述图案 所述图案包括尺寸大于网格单元的尺寸的特征，在每个单元中，所述探针被切换为“开”或“关”，其中所述目标上的探针覆盖比网格单元大得多的表面积，以及 其中在特征内，在探针大小的范围以及这种系统可以基于的方法上实现黑白写入的位置相关分布。

公开(公告)号：US09105439B2

公开(公告)日：2015-08-11

申请号：US13304427

申请日：2011-11-25

申请人： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Steenbrink

发明人： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Steenbrink

IPC分类号： H01J37/317 ,  H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/30

CPC分类号： H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151

摘要： The invention relates to a charged particle optical system comprising a beamlet generator for generating a plurality of charged particle beamlets, an electrostatic deflection system for deflecting the beamlets, and a projection lens system for directing the beamlets from the beamlet generator towards the target. The electrostatic deflection system comprises a first electrostatic deflector and a second electrostatic deflector for scanning charged particle beamlets over the target. The second electrostatic deflector is located behind the first electrostatic deflector so that, during operation of the system, a beamlet generated by the beamlet generator passes both of the electrostatic deflectors. During operation of the first and second electrostatic deflectors the system is adapted to apply voltages on the first electrostatic deflector and the second electrostatic deflector of opposite sign.

摘要翻译： 本发明涉及一种带电粒子光学系统，其包括用于产生多个带电粒子子束的子束发生器，用于偏转子束的静电偏转系统，以及用于将子束从小波发生器引导到目标的投影透镜系统。 静电偏转系统包括用于在靶上扫描带电粒子束的第一静电偏转器和第二静电偏转器。 第二静电偏转器位于第一静电偏转器的后面，使得在系统操作期间，由小梁发生器产生的子束通过两个静电偏转器。 在第一和第二静电偏转器的操作期间，系统适于在第一静电偏转器和相反符号的第二静电偏转器上施加电压。

公开(公告)号：US20080023643A1

公开(公告)日：2008-01-31

申请号：US11880872

申请日：2007-07-23

申请人： Pieter Kruit ,  Yanxia Zhang ,  Martijn Van Bruggen ,  Stijn Willem Steenbrink

发明人： Pieter Kruit ,  Yanxia Zhang ,  Martijn Van Bruggen ,  Stijn Willem Steenbrink

IPC分类号： G21K1/08

CPC分类号： H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

摘要： The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

摘要翻译： 本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

公开(公告)号：US20110216299A1

公开(公告)日：2011-09-08

申请号：US13076540

申请日：2011-03-31

申请人： Stijn Willem STEENBRINK ,  Johan Joost Koning ,  Peter Veltman

发明人： Stijn Willem STEENBRINK ,  Johan Joost Koning ,  Peter Veltman

IPC分类号： G03B27/54 ,  H01J3/14 ,  B23P17/04

CPC分类号： H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/004 ,  H01J2237/0203 ,  H01J2237/03 ,  H01J2237/04924 ,  Y10T29/49

摘要： An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first aperture, a voltage supply for supplying a first voltage to the first conductive plate and a second voltage to the second conductive plate, the first voltage being lower than the second voltage, and an insulating structure for separating the first conductive plate from the second conductive plate. The insulating structure comprises a first portion in contact with the first conductive plate and a second portion in contact with the second conductive plate, the first portion having an overhanging portion and the second portion having an indented portion at an edge of the insulating structure, so that a gap is formed between the overhanging portion and the second conductive plate.

摘要翻译： 一种静电透镜，包括具有第一孔的第一导电板，具有第二孔的第二导电板，所述第二孔基本上与所述第一孔对准，用于向所述第一导电板提供第一电压的电压源和第二电压 到第二导电板，第一电压低于第二电压，以及用于将第一导电板与第二导电板分离的绝缘结构。 绝缘结构包括与第一导电板接触的第一部分和与第二导电板接触的第二部分，第一部分具有突出部分，第二部分在绝缘结构的边缘处具有凹入部分，因此 在悬伸部分和第二导电板之间形成间隙。