Invention Grant
US09105754B2 Adhesive film, method of manufacturing semiconductor device, and semiconductor device
有权
粘合膜,半导体装置的制造方法以及半导体装置
- Patent Title: Adhesive film, method of manufacturing semiconductor device, and semiconductor device
- Patent Title (中): 粘合膜,半导体装置的制造方法以及半导体装置
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Application No.: US13929612Application Date: 2013-06-27
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Publication No.: US09105754B2Publication Date: 2015-08-11
- Inventor: Yuichiro Shishido , Sadahito Misumi , Kenji Onishi
- Applicant: NITTO DENKO CORPORATION
- Applicant Address: JP Osaka
- Assignee: NITTO DENKO CORPORATION
- Current Assignee: NITTO DENKO CORPORATION
- Current Assignee Address: JP Osaka
- Agency: Knobbe Martens Olson and Bear, LLP
- Priority: JP2012-145722 20120628
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L23/31 ; H01L25/00 ; H01L25/03

Abstract:
Provided is an adhesive film that enables manufacturing of a high quality semiconductor device with good yield ratio, and related methods of manufacturing a semiconductor device, and semiconductor devices. Provided is an adhesive film for embedding a first semiconductor element fixed to an adherend and fixing a second semiconductor element that is different from the first semiconductor element to the adherend, wherein the adhesive film has a thickness T that is larger than a thickness T1 of the first semiconductor element, and the adherend and the first semiconductor element are connected by wire bonding and a difference between the thickness T and the thickness T1 is 40 μm or more and 260 μm or less, or the adherend and the first semiconductor element are connected by flip-chip bonding and a difference between the thickness T and the thickness T1 is 10 μm or more and 200 μm or less.
Public/Granted literature
- US20140001654A1 ADHESIVE FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Public/Granted day:2014-01-02
Information query
IPC分类: