Invention Grant
- Patent Title: Gasification quench chamber dip tube
- Patent Title (中): 气化淬火室浸管
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Application No.: US12957276Application Date: 2010-11-30
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Publication No.: US09109173B2Publication Date: 2015-08-18
- Inventor: Helge Burghard Herwig Klockow , Prashant Tiwari
- Applicant: Helge Burghard Herwig Klockow , Prashant Tiwari
- Applicant Address: US NY Niskayuna
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Niskayuna
- Agent Joseph J. Christian
- Main IPC: B01J7/00
- IPC: B01J7/00 ; C10K1/04 ; B01D47/02 ; C10K1/10 ; C10J3/48 ; C10J3/52 ; C10J3/84 ; C10J3/74

Abstract:
A gasification quench chamber dip tube component is disclosed. The dip tube includes an elongate hollow element that has a first intake end and a second discharge end that is located distally opposite the intake end. The second discharge end includes either a plurality of elongate openings that are displaced circumferentially around the hollow element or a plurality of elongate elements displaced circumferentially around the hollow element thereby defining a plurality of elongate spaces therebetween that extend axially from the second discharge end. A quench chamber that employs the dip tube is also disclosed.
Public/Granted literature
- US20110120009A1 GASIFICATION QUENCH CHAMBER DIP TUBE Public/Granted day:2011-05-26
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