发明授权
- 专利标题: Lithographic apparatus, EUV radiation generation apparatus and device manufacturing method
- 专利标题(中): 光刻设备,EUV辐射发生装置及器件制造方法
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申请号: US13817792申请日: 2011-08-04
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公开(公告)号: US09110377B2公开(公告)日: 2015-08-18
- 发明人: Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Erik Petrus Buurman , Uwe Bruno Heini Stamm
- 申请人: Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Erik Petrus Buurman , Uwe Bruno Heini Stamm
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 国际申请: PCT/EP2011/063443 WO 20110804
- 国际公布: WO2012/031841 WO 20120315
- 主分类号: H05G2/00
- IPC分类号: H05G2/00 ; G03F7/20 ; B23K26/06 ; H01S3/00 ; H01S3/23
摘要:
An EUV radiation generation apparatus includes a laser configured to generate pulses of laser radiation, and an optical isolation apparatus that includes a rotatably mounted reflector and a radially positioned reflector. The rotatably mounted reflector and the laser are synchronized such that a reflective surface of the rotatably mounted reflector is in optical communication with the radially positioned reflector when the optical isolation apparatus receives a pulse of laser radiation to allow the pulse of laser radiation to pass to a plasma formation location and cause a radiation emitting plasma to be generated via vaporization of a droplet of fuel material. The rotatably mounted reflector and the laser are further synchronized such that the reflective surface of the rotatably mounted reflector is at least partially optically isolated from the radially positioned reflector when the optical isolation apparatus receives radiation reflected from the plasma formation location.