Invention Grant
- Patent Title: Deposition apparatus
- Patent Title (中): 沉积装置
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Application No.: US13948245Application Date: 2013-07-23
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Publication No.: US09120114B2Publication Date: 2015-09-01
- Inventor: Sang-Jin Jeong
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP HOLDINGS B.V.
- Current Assignee: ASM IP HOLDINGS B.V.
- Current Assignee Address: NL Almere
- Agency: LEX IP Meister, PLLC
- Priority: KR10-2012-0086336 20120807
- Main IPC: B05C13/00
- IPC: B05C13/00 ; C23C16/458 ; H01L21/687
Abstract:
A deposition apparatus includes a substrate supporting pin that is fixed to a supporting plate through an autoalignment control unit to prevent the substrate supporting pin from being broken when loading or unloading a substrate, thereby preventing damaging the substrate and also preventing decreased yield that may result due to the breakage of the substrate supporting pin.
Public/Granted literature
- US20140041579A1 DEPOSITION APPARATUS Public/Granted day:2014-02-13
Information query
