发明授权
US09127368B2 Etchant and method for manufacturing display device using the same
有权
用于制造使用其的显示装置的蚀刻剂和方法
- 专利标题： Etchant and method for manufacturing display device using the same
- 专利标题（中）： 用于制造使用其的显示装置的蚀刻剂和方法
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申请号： US14318815申请日： 2014-06-30
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公开(公告)号： US09127368B2公开(公告)日： 2015-09-08
- 发明人: Seon-il Kim , In-Bae Kim , Hongsick Park , Jong-Hyun Choung , Inseol Kuk , Suckjun Lee , Giyong Nam , Youngchul Park , Inho Yu , Youngjin Yoon
- 申请人： SAMSUNG DISPLAY CO., LTD. , DONGWOO FINE-CHEM CO., LTD.
- 申请人地址： KR Yongin, Gyeonggi-do KR Iksan-si, Jeollabuk-do
- 专利权人： SAMSUNG DISPLAY CO., LTD.,DONGWOO FINE-CHEM CO., LTD.
- 当前专利权人： SAMSUNG DISPLAY CO., LTD.,DONGWOO FINE-CHEM CO., LTD.
- 当前专利权人地址： KR Yongin, Gyeonggi-do KR Iksan-si, Jeollabuk-do
- 代理机构： Lee & Morse, P.C.
- 优先权： KR10-2013-0142280 20131121
- 主分类号： H01L21/3213
- IPC分类号： H01L21/3213 ; C09K13/06 ; C09K13/08 ; C23F1/18
摘要：
An etchant includes, based on a total amount of the etchant, from about 0.5 to about 20 wt % of a persulfate, from about 0.01 to about 2 wt % of a fluorine compound, from about 1 to about 10 wt % of an inorganic acid, from about 0.5 to about 5 wt % of an azole compound, from about 0.1 to about 5 wt % of an electron-donating compound, from about 0.1 to about 5 wt % of a chlorine compound, from about 0.05 to about 3 wt % of a copper salt, from about 0.1 to about 10 wt % of an organic acid or an organic acid salt, and a remaining amount of water.
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