Invention Grant
- Patent Title: Techniques for optimized scatterometry
- Patent Title (中): 优化散射法的技术
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Application No.: US13712734Application Date: 2012-12-12
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Publication No.: US09127927B2Publication Date: 2015-09-08
- Inventor: Jonathan Iloreta , Paul Aoyagi , Hanyou Chu , Jeffrey Chard , Peilin Jiang , Mikhail Sushchik , Leonid Poslavsky , Philip D. Flanner, III
- Applicant: Jonathan Iloreta , Paul Aoyagi , Hanyou Chu , Jeffrey Chard , Peilin Jiang , Mikhail Sushchik , Leonid Poslavsky , Philip D. Flanner, III
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Blakely Sokoloff Taylor Zafman LLP
- Main IPC: G06F17/16
- IPC: G06F17/16 ; G01B11/30 ; G06F7/00 ; G06F17/40 ; G06F19/00 ; G01B11/00 ; H01L21/66 ; G01B11/24 ; G03F7/20

Abstract:
Provided are optimized scatterometry techniques for evaluating a diffracting structure. In one embodiment, a method includes computing a finite-difference derivative of a field matrix with respect to first parameters (including a geometric parameter of the diffracting structure), computing an analytic derivative of the Jones matrix with respect to the field matrix, computing a derivative of the Jones matrix with respect to the first parameters, and computing a finite-difference derivative of the Jones matrix with respect to second parameters (including a non-geometric parameter). In one embodiment, a method includes generating a transfer matrix having Taylor Series approximations for elements, and decomposing the field matrix into two or more smaller matrices based on symmetry between the incident light and the diffracting structure.
Public/Granted literature
- US20130158948A1 TECHNIQUES FOR OPTIMIZED SCATTEROMETRY Public/Granted day:2013-06-20
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