TECHNIQUES FOR OPTIMIZED SCATTEROMETRY
    1.
    发明申请
    TECHNIQUES FOR OPTIMIZED SCATTEROMETRY 有权
    优化分析的技术

    公开(公告)号:US20130158948A1

    公开(公告)日:2013-06-20

    申请号:US13712734

    申请日:2012-12-12

    IPC分类号: G01B11/00 G06F17/16

    摘要: Provided are optimized scatterometry techniques for evaluating a diffracting structure. In one embodiment, a method includes computing a finite-difference derivative of a field matrix with respect to first parameters (including a geometric parameter of the diffracting structure), computing an analytic derivative of the Jones matrix with respect to the field matrix, computing a derivative of the Jones matrix with respect to the first parameters, and computing a finite-difference derivative of the Jones matrix with respect to second parameters (including a non-geometric parameter). In one embodiment, a method includes generating a transfer matrix having Taylor Series approximations for elements, and decomposing the field matrix into two or more smaller matrices based on symmetry between the incident light and the diffracting structure.

    摘要翻译: 提供了用于评估衍射结构的优化散射测量技术。 在一个实施例中,一种方法包括相对于第一参数(包括衍射结构的几何参数)计算场矩阵的有限差分导数,计算相对于场矩阵的Jones矩阵的分析导数,计算 相对于第一参数的Jones矩阵的导数,以及相对于第二参数(包括非几何参数)计算Jones矩阵的有限差分导数。 在一个实施例中,一种方法包括生成对于元素具有泰勒级数逼近的传递矩阵,并且基于入射光和衍射结构之间的对称性将场矩阵分解为两个或更多个较小的矩阵。