Invention Grant
- Patent Title: Hierarchical wafer yield prediction method and hierarchical lifetime prediction method
- Patent Title (中): 分层晶圆产量预测方法和分层寿命预测方法
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Application No.: US14099997Application Date: 2013-12-08
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Publication No.: US09129076B2Publication Date: 2015-09-08
- Inventor: Hsin-Ming Hou , Ji-Fu Kung
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Science-Based Industrial Park, Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Science-Based Industrial Park, Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Main IPC: G06F17/50
- IPC: G06F17/50 ; H01L21/66

Abstract:
For improving wafer fabrication, yield and lifetime of wafers are predicted by determining coefficients of a yield domain for wafer yield prediction and a lifetime domain for a wafer lifetime prediction, an integral domain, an electric/layout domain, a metrology/defect domain, and a machine sensor domain in a hierarchical manner. With the aid of the hierarchically-determined coefficients, noises in prediction can be reduced so that precision of prediction results of the yields or the lifetimes of wafers can be raised.
Public/Granted literature
- US20140089871A1 Hierarchical Wafer Yield Prediction Method and Hierarchical Lifetime Prediction Method Public/Granted day:2014-03-27
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