Invention Grant
US09129076B2 Hierarchical wafer yield prediction method and hierarchical lifetime prediction method 有权
分层晶圆产量预测方法和分层寿命预测方法

Hierarchical wafer yield prediction method and hierarchical lifetime prediction method
Abstract:
For improving wafer fabrication, yield and lifetime of wafers are predicted by determining coefficients of a yield domain for wafer yield prediction and a lifetime domain for a wafer lifetime prediction, an integral domain, an electric/layout domain, a metrology/defect domain, and a machine sensor domain in a hierarchical manner. With the aid of the hierarchically-determined coefficients, noises in prediction can be reduced so that precision of prediction results of the yields or the lifetimes of wafers can be raised.
Information query
Patent Agency Ranking
0/0