Invention Grant
- Patent Title: Lateral semiconductor device with vertical breakdown region
- Patent Title (中): 具有垂直击穿区域的侧向半导体器件
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Application No.: US13973482Application Date: 2013-08-22
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Publication No.: US09129802B2Publication Date: 2015-09-08
- Inventor: Andrew P. Ritenour
- Applicant: RF Micro Devices, Inc.
- Applicant Address: US NC Greensboro
- Assignee: RF Micro Devices, Inc.
- Current Assignee: RF Micro Devices, Inc.
- Current Assignee Address: US NC Greensboro
- Agency: Withrow & Terranova, P.L.L.C.
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L27/02 ; H01L29/417 ; H01L29/778 ; H01L29/861 ; H01L29/20

Abstract:
A lateral semiconductor device having a vertical region for providing a protective avalanche breakdown (PAB) is disclosed. The lateral semiconductor device has a lateral structure that includes a conductive substrate, semi-insulating layer(s) disposed on the conductive substrate, device layer(s) disposed on the semi-insulating layer(s), along with a source electrode and a drain electrode disposed on the device layer(s). The vertical region is separated from the source electrode by a lateral region wherein the vertical region has a relatively lower breakdown voltage level than a relatively higher breakdown voltage level of the lateral region for providing the PAB within the vertical region to prevent a potentially damaging breakdown of the lateral region. The vertical region is structured to be more rugged than the lateral region and thus will not be damaged by a PAB event.
Public/Granted literature
- US20140054585A1 LATERAL SEMICONDUCTOR DEVICE WITH VERTICAL BREAKDOWN REGION Public/Granted day:2014-02-27
Information query
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