Invention Grant
US09129895B2 In situ real-time wafer breakage detection 有权
原位实时晶片断裂检测

In situ real-time wafer breakage detection
Abstract:
The disclosure provides a real-time wafer breakage detection method. The detection method includes the following operations. A wafer is positioned on a wafer holder of a process chamber in which a thermal process is being performed. Then, the temperature at the wafer holder is measured. And, a notification for corrective action is issued if the temperature is out of a predetermined alarm range.
Public/Granted literature
Information query
Patent Agency Ranking
0/0