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公开(公告)号:US10700181B2
公开(公告)日:2020-06-30
申请号:US15590418
申请日:2017-05-09
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wei-Han Huang , Wen-Yen Chen , Jing-Huei Huang
IPC: H01L29/66 , H01L29/08 , H01L29/78 , H01L21/02 , H01L21/22 , H01L21/311 , H01L21/3115 , H01L21/38 , H01L21/28 , H01L29/423 , H01L21/223
Abstract: A FinFET device structure and method for forming the same are provided. The method includes forming a fin structure over a substrate and forming a dummy gate electrode over a middle portion of the fin structure. The method also includes forming a spacer layer on the dummy gate electrode and on the fin structure and performing a plasma doping process on the dummy gate electrode and on the spacer layer. The method further includes performing an annealing process, wherein the annealing process is performed by using a gas comprising oxygen, such that a doped region is formed in a portion of the fin structure, and the spacer layer is doped with oxygen after the annealing process.
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公开(公告)号:US09129895B2
公开(公告)日:2015-09-08
申请号:US14049464
申请日:2013-10-09
Applicant: Taiwan Semiconductor Manufacturing Co., LTD.
Inventor: Su-Hao Liu , Chien-Hung Lin , Wei-Han Huang , Zi-Wei Fang
CPC classification number: H01L22/26 , H01L21/67248 , H01L21/67288 , H01L22/12
Abstract: The disclosure provides a real-time wafer breakage detection method. The detection method includes the following operations. A wafer is positioned on a wafer holder of a process chamber in which a thermal process is being performed. Then, the temperature at the wafer holder is measured. And, a notification for corrective action is issued if the temperature is out of a predetermined alarm range.
Abstract translation: 本公开提供了一种实时晶片断裂检测方法。 检测方法包括以下操作。 晶片位于正在进行热处理的处理室的晶片保持器上。 然后,测量晶片架上的温度。 并且,如果温度超出预定的报警范围,则发出纠正措施的通知。
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公开(公告)号:US20150097676A1
公开(公告)日:2015-04-09
申请号:US14049464
申请日:2013-10-09
Applicant: Taiwan Semiconductor Manufacturing Co., LTD.
Inventor: Su-Hao Liu , Chien-Hung Lin , Wei-Han Huang , Zi-Wei Fang
CPC classification number: H01L22/26 , H01L21/67248 , H01L21/67288 , H01L22/12
Abstract: The disclosure provides a real-time wafer breakage detection method. The detection method includes the following operations. A wafer is positioned on a wafer holder of a process chamber in which a thermal process is being performed. Then, the temperature at the wafer holder is measured. And, a notification for corrective action is issued if the temperature is out of a predetermined alarm range.
Abstract translation: 本公开提供了一种实时晶片断裂检测方法。 检测方法包括以下操作。 晶片位于正在进行热处理的处理室的晶片保持器上。 然后,测量晶片架上的温度。 并且,如果温度超出预定的报警范围,则发出纠正措施的通知。
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