Invention Grant
- Patent Title: Field-effect semiconductor device
- Patent Title (中): 场效应半导体器件
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Application No.: US13906738Application Date: 2013-05-31
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Publication No.: US09136397B2Publication Date: 2015-09-15
- Inventor: Jens Konrath , Hans-Joachim Schulze , Roland Rupp , Wolfgang Werner , Frank Pfirsch
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/80
- IPC: H01L29/80 ; H01L29/812 ; H01L29/04 ; H01L29/16 ; H01L29/66 ; H01L29/267 ; H01L29/872

Abstract:
A field-effect semiconductor device having a semiconductor body with a main surface is provided. The semiconductor body includes, in a vertical cross-section substantially orthogonal to the main surface, a drift layer of a first conductivity type, a semiconductor mesa of the first conductivity type adjoining the drift layer, substantially extending to the main surface and having two side walls, and two second semiconductor regions of a second conductivity type arranged next to the semiconductor mesa. Each of the two second semiconductor regions forms a pn-junction at least with the drift layer. A rectifying junction is formed at least at one of the two side walls of the mesa. Further, a method for producing a heterojunction semiconductor device is provided.
Public/Granted literature
- US20140353667A1 Semiconductor Device and Manufacturing Method Therefor Public/Granted day:2014-12-04
Information query
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